Interconnect Resistance
Calculated on an ohms/sq basis
Poly 2.6 2.6 Metal1 0.070 0.06 Metal2 0.070 0.06 Metal3 0.035 0.06 Metal4 NA 0.03
The poly is silicided which means that it has fairly low resistance (for comparison, the Orbit 1.2u process has poly that is 23 ohms/square). So poly can be used as a local interconnect (short runs, between 20-30 um, within a Cell).